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Split-Gate FETs (SG-FETs) – SemiEngineering

This technical paper titled “Longitudinal and latitudinal split-gate field-effect transistors for NAND and NOR logic circuit applications” was published by researchers at Department of Electrical and Computer Engineering, Inha University (South Korea) and Korea Institute of Science and Technology (KIST), Seoul.
“Two-dimensional (2D) materials have been extensively adopted in various device architectures for advanced applications owing to their structural diversity, high functionality, and ease of integration. Among the various architectures, split-gate field-effect transistors (SG-FETs) have been widely studied based on their sequentially located SG electrode along the source/drain electrodes. In this paper, we propose two different homogeneous molybdenum disulfide (MoS2)-based SG-FET structures, namely AND-FET and OR-FET, whose gap directions are perpendicular to each other. It can exhibit AND or OR switching characteristics if it has a longitudinal or latitudinal gapped SG structure, respectively. Moreover, the AND-FET and OR-FET are regarded as folded structures of series and parallel connections of two n-type transistors. By using these switching devices, we successfully demonstrate NAND and NOR logic gates through a single active channel. These approaches are expected to pave the way for the realization of multi-functionality and high integration of 2D material-based future electronic devices.”
Find the technical paper here. Published July 2022.
Lee, M., Park, C.Y., Hwang, D.K. et al. Longitudinal and latitudinal split-gate field-effect transistors for NAND and NOR logic circuit applications. npj 2D Mater Appl 6, 45 (2022). https://doi.org/10.1038/s41699-022-00320-w.
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